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MiCo

Coating Powder

MiCo’s coating powder is a functional powder manufactured through granulation technology using ceramic raw materials to coat parts with a high-quality layer.

In addition to Y2O3, which is widely used in semiconductor equipment components, MiCo is dedicated to the development of advanced materials for next-generation semiconductor manufacturing processes. To meet customer demands, MiCo applies the innovative coating powders that provide enhanced plasma resistance, extended lifespan, and improved process characteristics.

ceramic powder top 이미지

Characteristics of Coating Powder

Powder type Application Advantages

Y2O3
Fluorides
YAG

APS (Atmospheric Plasma Spray)

Particle generation control and process stabilization by imparting plasma resistance characteristics to semiconductor equipment parts

AD (Aerosol Depostion)

Improvement of plasma resistance characteristics and control of particle generation by surface densification

PVD (Physical Vapor Deposition)

Maximizing plasma resistance by ultra-high density
and ultra-flatness of coating layer,
Control of particle generation and seasoning time

SPS (Suspension Plasma Spray)

Particle generation control and process stabilization by strong substrate adhesion and by formation of high-density coating films

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Coating Powder Line Up

ceramic coating 슬라이드 이미지

Y2O3

  • Excellent plasma resistance
  • Control of particle generation in process
  • Available to control the characteristics of primary particle & granule (granule size, density, etc)
ceramic coating 슬라이드 이미지

Yttrium Aluminum Oxide

  • Excellent plasma resistance
  • Crystal-phase controllable (YAG, YAP, YAM)
  • Control of particle generation in process
ceramic coating 슬라이드 이미지

YF3 / YOF

  • Minimizing reaction with plasma gas
  • Reduction of seasoning time
  • O/F content controllable
ceramic coating 슬라이드 이미지

Special coating materials

  • Implementation of high density coating
  • High flowability of fine Powder (≤ 20 ㎛)
  • Various coating materials applicable
ceramic coating 슬라이드 이미지

Slurry for SPS coating

  • Implementation of ultra-high density coating
  • Suppress of particle generation by maximizing plasma resistance
  • Various coating materials applicable
ceramic coating 슬라이드 이미지

Source for PVD coating

  • Implementation of ultra-high density & ultra-low roughness coating
  • Suppress of particle generation by maximizing plasma resistance
  • Available to control coating source & density

Characteristics & Advantages of Coating Powder

coating ceramic 특징 이미지
coating ceramic 특징 이미지

Y2O3

  • · Excellent plasma resistance
  • · Control of particle generation in process
  • · Available to control the characteristics of primary particle & granule
    (granule size, density, etc)
coating ceramic 특징 이미지
coating ceramic 특징 이미지

Yttrium Aluminum Oxide

  • · Excellent plasma resistance
  • · Crystal-phase controllable (YAG, YAP, YAM)
  • · Control of particle generation in process
coating ceramic 특징 이미지
coating ceramic 특징 이미지

Fluorides (YF3, YOF)

  • · Minimizing reaction with plasma gas
  • · Reduction of seasoning time
  • · O/F content controllable
coating ceramic 특징 이미지
coating ceramic 특징 이미지

Special coating materials

  • · Implementation of high density coating
  • · High flowability of fine Powder (≤ 20 ㎛)
  • · Various coating materials applicable
coating ceramic 특징 이미지
coating ceramic 특징 이미지

Slurry for SPS coating

  • · Implementation of ultra-high density coating
  • · Suppress of particle generation by maximizing plasma resistance
  • · Various coating materials applicable
coating ceramic 특징 이미지
coating ceramic 특징 이미지

Source for PVD coating

  • · Implementation of ultra-high density & ultra-low roughness coating
  • · Suppress of particle generation by maximizing plasma resistance
  • · Available to control coating source & density

Application

ceramic process 이미지

Coating materials for semiconductor etching equipment

Dry etching process

coating app 이미지
coating app 이미지
coating app 이미지
coating app 이미지