MiCo
Coating Powder
MiCo’s coating powder is a functional powder manufactured through granulation technology using ceramic raw materials to coat parts with a high-quality layer.
In addition to Y2O3, which is widely used in semiconductor equipment components, MiCo is dedicated to the development of advanced materials for next-generation semiconductor manufacturing processes. To meet customer demands, MiCo applies the innovative coating powders that provide enhanced plasma resistance, extended lifespan, and improved process characteristics.
Characteristics of Coating Powder
Characteristics & Advantages of Coating Powder
Y2O3
- · Excellent plasma resistance
- · Control of particle generation in process
- · Available to control the characteristics of primary particle & granule
(granule size, density, etc)
Yttrium Aluminum Oxide
- · Excellent plasma resistance
- · Crystal-phase controllable (YAG, YAP, YAM)
- · Control of particle generation in process
Fluorides (YF3, YOF)
- · Minimizing reaction with plasma gas
- · Reduction of seasoning time
- · O/F content controllable
Special coating materials
- · Implementation of high density coating
- · High flowability of fine Powder (≤ 20 ㎛)
- · Various coating materials applicable
Slurry for SPS coating
- · Implementation of ultra-high density coating
- · Suppress of particle generation by maximizing plasma resistance
- · Various coating materials applicable
Source for PVD coating
- · Implementation of ultra-high density & ultra-low roughness coating
- · Suppress of particle generation by maximizing plasma resistance
- · Available to control coating source & density
Application
Coating materials for semiconductor etching equipment